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Far & Away with Hanne van Ooij for Design SCENE Magazine #13 Issue

January 4, 2017
in Alex van der Steen, DESIGN SCENE Magazine, Editorial Photography, Eric Elenbaas Agency, Exclusive, Fashion Magazines, Female Models
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Far and away story captured for our Design SCENE Magazine‘s January / February 2017 edition by fashion photographer Cristian Davila Hernandez at Eric Elenbaas Agency features the striking Hanne van Ooij at VDM Models. Hair and makeup is work of beauty artist Liselotte van Saarloos at EE Agency for MAC Cosmetics / Laura Mercier / Kevin Murphy / TUSH Brushes.

GET YOUR COPY IN PRINT $24.90 AND DIGITAL $3.90

In charge of styling was Alex van der Steen who for the session selected looks from brands such as Celine, Maison the Faux, Calvin Klein Collection, Avelon, Patricia Pepe, Island Studio, Topshop Unique, Baum & Pferdgarten, David Laport, Karim Adduchi, Versace, River Island, Elisabetta Franchi, Vetements, Drykorn, Humanoid, Asos, Gucci, Joseph, Filippa K, BCBG Max Azria, BLK DNM, Jimmy Choo, A.F. Vandevorst, Jil Sander, Michael Kors, Costume National, MTWTF Weekday, Y’s Yohji Yamamoto, Benchellal, Dolce & Gabbana, Agent Provocateur, and French Connection. Styling assistance Daisy Smit.


Photographer Cristian Davila Hernandez at Eric Elenbaas Agency
Stylist Alex van der Steen
Hair and Makeup Liselotte van Saarloos at EE Agency for MAC Cosmetics/ Laura Mercier/ Kevin Murphy/ TUSH Brushes
Model Hanne van Ooij at VDM models
Stylist Assistant Daisy Smit

GET YOUR COPY IN PRINT $24.90 AND DIGITAL $3.90

Tags: Design SCENE MagazineExclusivefashion photography
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